IIT-Hyderabad and University of Hyderabad Researchers Secure Patent for Innovative Nanomaterial Fabrication

Researchers from the University of Hyderabad (UoH) and the Indian Institute of Technology Hyderabad (IIT-H) have been granted a patent for a novel method to fabricate thin transition metal dichalcogenide (TMDC) nanosheets. The method uses Bessel beam femtosecond laser ablation, offering a rapid, cost-effective, and scalable alternative to conventional techniques.

TMDCs are two-dimensional materials with potential applications in next-generation electronics, optoelectronics, and photonics. However, existing methods to isolate ultra-thin TMDC layers are often slow, expensive, or difficult to scale. The new approach addresses these challenges by using a specially shaped femtosecond laser beam to precisely separate TMDC layers. It breaks weak van der Waals forces without altering the material's chemical structure, enabling instant production of pristine single- and few-layer nanosheets.

The innovation was developed by Sai Santosh Kumar Raavi, Challa Rajendra Kumar, and Moram Sree Satya Bharati from IIT-H, and Professor Soma Venugopal Rao from UoH's School of Physics. The patent was granted by the Indian Patent Office, as announced in a UoH release.

This breakthrough could significantly advance the fabrication of nanoscale materials, making them more accessible for research and industrial applications. The team's work demonstrates the potential of laser-based techniques in nanotechnology.